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February 25, 2024
DHEM & Atom Probe combined provide never-seen-before insights and process efficiencies
Scotts Valley, CA February 25, 2024 ALP Inc.’s Differential Hall Effect Metrology
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November 30, 2023
Electrical profiles of Graded-Ge SiGe films: A New ALPro Capability
Scotts Valley, CA November 30, 2023 As is known in industry ALP’s
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March 30, 2023
MRS Advances: Paper on completeness and validation of DHEM profile data
Scotts Valley, CA March 30, 2023 ALP published a detailed paper on
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November 17, 2022
241 ECS: In-depth comparison of Scanning Spreading Resistance Microscopy (SSRM) with Differential Hall Effect Metrology (DHEM) on highly doped Silicon epi materials with imec.
Scotts Valley, CA November 17, 2022 The 241 ECS meeting published interesting
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September 5, 2022
Journal of Material Science: Differential Hall Effect Metrology (DHEM) used to analyze BF2 and P doped ultra-shallow polySi materials with TSRI.
Scotts Valley, CA September 5, 2022 ALP’s Differential Hall Effect Metrology (DHEM) was used
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July 15, 2022
Differential Hall Effect Metrology (DHEM) of UV-laser annealed for 3D-stacked CMOS with SCREEN/LASSE
Scotts Valley, CA July 15, 2022 SCREEN/LASSE recently published new ALPro(TM) 100
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June 29, 2022
Spreading Resistance Profiling (SRP) vs Differential Hall Effect Metrology (DHEM) with TSRI: New data published at FCMN 2022
Scotts Valley, CA June 29, 2022 The Taiwan Semiconductor Research Institute (TSRI) and
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May 10, 2022
Differential Hall Effect Metrology (DHEM) vs SSRM with imec: New data published at FCMN 2022
Scotts Valley, CA May 10, 2022 New data from ALP will be
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February 3, 2022
IEEE JEDS publication on sub-nm carrier profiling in highly doped Epi SiP using Differential Hall Effect Metrology (DHEM)
Scotts Valley, CA February 3, 2022 – ALP published a journal article on
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June 25, 2021
IWJT 2021 publication on dopant activation in Si using Differential Hall Effect Metrology (DHEM)
Scotts Valley, CA June 25, 2021 – ALP recently published an interesting
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