ALPro™ 50 & ALPro™ 100 PROFILERS

ALPro™ 50 and ALPro™ 100 are metrology tools for depth profiling electrical properties of semiconductor layers at atomic-level resolution. ALPro™ technology utilizes proprietary processing and Differential Hall Effect Metrology (DHEM) technique. Key applications include characterization/optimization of ultra-shallow junctions, high mobility materials, epi-layers and doping/anneal processes.  


ALPro™ 50 FEATURES

• Up to 50mmx50mm size coupon handling
• Two chemical delivery lines
• Measurement of mobility, carrier concentration, sheet resistance, resistivity depth profiles for Si, SiGe, Ge and III-V compounds
• Typical measurement depth: 100nm
• Sub-nm depth resolution
• Sheet Resistance range: up to 100M Ω/□
• Magnetic field: ~5000 Gauss (kits available down to 100 Gauss)
• Automated processing with direct data transfer

 
ALPro™ 100 FEATURES

• Up to 100mmx100mm size coupon handling
• Four chemical delivery lines
• On board sample preparation capability (material dependent)
• Measurement of mobility, carrier concentration, sheet resistance, resistivity depth profiles for Si, SiGe, Ge and III-V compounds
• Typical measurement depth: >100nm (material dependent)
• Sub-nm depth resolution
• Sheet Resistance range: up to 100M Ω/□
• Magnetic field: ~8000 Gauss and 2000 Gauss (kit available for ~100 Gauss and 1000 Gauss)
• Automated processing with direct data transfer