February 11, 2025CEA-Leti relies on ALP technology to quantify activation in novel laser processScotts Valley, CA February 10, 2025 The semiconductor industry now has access […]
October 31, 2024ALP publishes new DHEM review article in Journal METROLOGYScotts Valley, CA October 24, 2024 ALP’s Differential Hall Effect Metrology (DHEM) systems […]
February 25, 2024DHEM & Atom Probe combined provide never-seen-before insights and process efficienciesScotts Valley, CA February 25, 2024 ALP Inc.’s Differential Hall Effect Metrology […]
November 30, 2023Electrical profiles of Graded-Ge SiGe films: A New ALPro CapabilityScotts Valley, CA November 30, 2023 As is known in industry ALP’s […]
March 30, 2023MRS Advances: Paper on completeness and validation of DHEM profile dataScotts Valley, CA March 30, 2023 ALP published a detailed paper on […]
November 17, 2022241 ECS: In-depth comparison of Scanning Spreading Resistance Microscopy (SSRM) with Differential Hall Effect Metrology (DHEM) on highly doped Silicon epi materials with imec.Scotts Valley, CA November 17, 2022 The 241 ECS meeting published interesting […]
September 5, 2022Journal of Material Science: Differential Hall Effect Metrology (DHEM) used to analyze BF2 and P doped ultra-shallow polySi materials with TSRI.Scotts Valley, CA September 5, 2022 ALP’s Differential Hall Effect Metrology (DHEM) was used […]
July 15, 2022Differential Hall Effect Metrology (DHEM) of UV-laser annealed for 3D-stacked CMOS with SCREEN/LASSEScotts Valley, CA July 15, 2022 SCREEN/LASSE recently published new ALPro(TM) 100 […]
June 29, 2022Spreading Resistance Profiling (SRP) vs Differential Hall Effect Metrology (DHEM) with TSRI: New data published at FCMN 2022Scotts Valley, CA June 29, 2022 The Taiwan Semiconductor Research Institute (TSRI) and […]
May 10, 2022Differential Hall Effect Metrology (DHEM) vs SSRM with imec: New data published at FCMN 2022Scotts Valley, CA May 10, 2022 New data from ALP will be […]