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Spreading Resistance Profiling (SRP) vs Differential Hall Effect Metrology (DHEM) with TSRI: New data published at FCMN 2022

Scotts Valley, CA June 29, 2022 

The Taiwan Semiconductor Research Institute (TSRI) and ALP will be presenting new data at the upcoming 2022 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN 2022).

As you may know ALP’s Differential Hall Effect Metrology (DHEM) provides sub-nm resolution resistivity, mobility and, carrier depth profiles of semiconductors. In this publication, we compare DHEM and Spreading Resistance Profiling (SRP) measurements to gauge accuracy and reliability of both techniques.

SRP provides spreading resistance profile data which is converted to carrier profiles via calibration.  DHEM measures resistivity, mobility and carrier profiles using Van der Pauw/Hall Effect measurements. SRP depth profile data quality strongly depend on sample prep and the ability to make good, reliable contacts to the material repeatedly as they are moved across the film. On the other hand, in DHEM sample prep, contact mechanism are standardized and the profiling is automated – which greatly improves data quality and reliability.

ALPro(TM) 100 is the most advanced DHEM system on the market. ALPro(TM) 100 can be used for many different semiconductors including Si, SiGe, Ge and power/RF materials.

There are additional studies here: alpinc.net/news