Scotts Valley, CA June 5, 2021 – ALP was invited to present at the 239th ECS Meeting. The presentation covered the data measured by the Differential Hall Effect Metrology (DHEM) as implemented in the ALPro™ tools, and the latest data measured on pSiGe and shallow implanted Si samples. This new data was developed jointly with with researchers at Imec (www.imec.be) and the Taiwan Semiconductor Research Institute (TSRI, www.tsri.org.tw/en/).
The presentation can be viewed here: 239th ECS Invited presentation
Abstract of the paper can be found here: https://ecs.confex.com/ecs/239/meetingapp.cgi/Paper/147952
Please email us at email@example.com for a pre-print version.