Scotts Valley, CA Oct 15, 2020 – ALP presented new data at the 2020 ECS PRiME Conference. In this paper, Differential Hall Effect Metrology (DHEM) as implemented in the ALPro™ tools, was used to study dopant activation with sub-nm resolution for SiP materials that were very highly doped (>1e21#/cm3 range). Data on activation in n-doped Ge is also presented.
You can see the presentation here: 2020 ECS PRiME presentation
Abstract of the paper can be found here: https://ecs.confex.com/ecs/prime2020/meetingapp.cgi/Paper/141222