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February 3, 2022
IEEE JEDS publication on sub-nm carrier profiling in highly doped Epi SiP using Differential Hall Effect Metrology (DHEM)
Scotts Valley, CA February 3, 2022 – ALP published a journal article on
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July 13, 2021
Applied Materials uses Differential Hall Effect Metrology (DHEM) to understand activation and deactivation in ultra-highly doped n-type Epitaxy
Scotts Valley, CA July 13, 2021 – The Differential Hall Effect Metrology (DHEM)
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December 10, 2020
Differential Hall Effect Metrology (DHEM) featured on the cover of EDFA magazine – the renowned failure analysis resource
Scotts Valley, CA Dec 10, 2020 – ALP was invited to publish
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