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ALP wins NSF SBIR Phase IIB award
September 14, 2018
FCMN: Mobility & Activation depth profiles for Si:GaAs at <2nm resolution
March 20, 2019
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Semiconductor Engineering publishes an article about ALP’s technology

Semiconductor Engineering, a premier publication on semiconductor process technology and business, published an article on ALP’s DHEM technique and ALPro™ technology.

Link: https://semiengineering.com/a-new-approach-to-metrology/

Screenshot of the article published in Semiengineering.com

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