ALP wins NSF SBIR Phase IIB award
September 14, 2018FCMN: Mobility & Activation depth profiles for Si:GaAs at <2nm resolution
March 20, 2019Semiconductor Engineering, a premier publication on semiconductor process technology and business, published an article on ALP’s DHEM technique and ALPro™ technology.
Link: https://semiengineering.com/a-new-approach-to-metrology/
