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February 3, 2022

IEEE JEDS publication on sub-nm carrier profiling in highly doped Epi SiP using Differential Hall Effect Metrology (DHEM)

Scotts Valley, CA February 3, 2022 – ALP published a journal article on […]
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July 13, 2021

Applied Materials uses Differential Hall Effect Metrology (DHEM) to understand activation and deactivation in ultra-highly doped n-type Epitaxy

Scotts Valley, CA July 13, 2021 – The Differential Hall Effect Metrology (DHEM) […]
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June 25, 2021

IWJT 2021 publication on dopant activation in Si using Differential Hall Effect Metrology (DHEM)

Scotts Valley, CA June 25, 2021 – ALP recently published an interesting […]
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June 5, 2021

Invited presentation: Characterization of Annealing and Dopant Activation Processes Using Differential Hall Effect Metrology (DHEM) (239th ECS, May 2021)

Scotts Valley, CA June 5, 2021 – ALP was invited to present at […]
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April 14, 2021

Invited paper: Characterization of Annealing and Dopant Activation Processes Using Differential Hall Effect Metrology (DHEM) (239th ECS, May 2021)

Scotts Valley, CA April 14, 2021 – Differential Hall Effect Metrology (DHEM) as […]
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December 10, 2020

Differential Hall Effect Metrology (DHEM) featured on the cover of EDFA magazine – the renowned failure analysis resource

Scotts Valley, CA Dec 10, 2020 – ALP was invited to publish […]
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